2005 Program
Program History
Application Process
For Participants
Contact Us
2005 Participant: Joelle Arnold


Project Title: Effect of Deposition Methods and Materials on the Heat- Transfer Characteristics of Thin Films

Faculty Advisor: Pam Norris

 


Joelle watching as argon plasma is released into the chamber
of the "turbo-sput" to release nickel ions, which form a thin
film on the surface of the silicon substrate.


Project Summary:

As solid-state components decrease in size, the overall effect of heat transfer in electrical devices becomes more important. By finding ways to control the thermal transport properties, manufacturers can produce faster and smaller computer chips. But for now, we are only trying to understand the properties of thin films.

Thin metallic films, such as nickel, gold, aluminum and chromium will be deposited on single crystalline substrates such as silicon and germanium wafers, as well as amorphous glass slides, by sputtering and evaporative methods. They will be characterized by grain size and shape using the scanning electron microscope and the atomic force microscope. Thermal transport properties will be measured using the Transient ThermoReflectance technique.



The samples of nickel thin-films
are carefully removed from the
sputter deposition chamber.



The profilometer (right) sends images (on monitor, left), for basic analysis of film surface characteristics.

 
 
Return to Full List of Participants.