2005 Program
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2005 Participant: JJ Elliott
 


Project Title:
Creating Atomically Flat Gold Surfaces for Molecule Deposition

Faculty Advisor:
Lloyd Harriott

   
AFM imaging is used to show the contours of the gold surface (in monitor, right).






An evaporator (left) is used to specify the thickness of gold which will be applied to the smaple surface.

Project Summary:


The purpose of this electro-chemical engineering research is the creation of nanochips using molecules rather than metals. Such nanochips hold the potential to create smaller devices with more power and greater storage capacity. In order to discover a method to engineer uniformly-smooth gold surfaces of atomic-scale thickness, the anneal process is performed by a Rapid Thermal Annealer (RTA), and analysis of the sample surface is then studied using an Atomic Force Microscope (AFM). The following aspects will be varied in this study: temperature of the anneal process, duration of the anneal process, thickness of the silicon, and deposition rate.
The sample (bottom left) is then placed in the rapid thermal annealer (RTA) in order to apply heat for crystallization of the gold surface. The crystallization process enables better AFM-imaging results.

 

 
 
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